PlasmaCVD-300


 

PlasmaCVD-300 is an all in one system, including Surface Activation, Etching, and Thin Film Deposition which is atmospheric pressure plasma chemical vapor deposition system. PlasmaCVD-300  is designed for any kindle of shapes, middle-small size nano coating platform, including curve surface articles. Now PlasmaCVD-300 is ready to serve customers with silica coating, titanium oxide coating, hydrophilic/hydrophobic coating and related applications with ECO process. (PlasmaCVD_300_DM)

PlasmaCVD-300_1

PlasmaCVD-300_2

PlasmaCVD-thin film_1